As semiconductors become increasingly precise and densely integrated, the demand for high-quality industrial water continues to grow. Ultraviolet systems are essential for producing the ultrapure water required in these applications.
The miniaturization of circuit patterns driven by higher capacity and greater integration in semiconductors has raised the quality standards for ultrapure water used in cleaning processes. With global semiconductor demand on the rise, ultrapure water production is expanding accordingly.
TOC UV systems reduce Total Organic Carbon (TOC) concentrations in production processes by irradiating ultrapure water with VUV-wavelength ultraviolet light, which carries high energy levels. This photolysis of water molecules generates hydroxyl radicals (OH radicals) that oxidize organic carbon in the ultrapure water, converting it to carbonates and bicarbonates for removal.
